Good quality tantalum sputtering target China Manufacturer

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Good quality tantalum sputtering target

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Payment Type:	L/C,T/T,D/P,Money Gram,Western Union
Incoterm:	FOB,CFR,CIF,FCA,CPT,CIP
Min. Order:	5 Bag/Bags
Delivery Time:	15 Days

Basic Info

Model No.: ZHIPU001

Application:: Vacuum Coating

Dimensions:: As Request

Density:: 16.6g/cm3

Product Name:: Tantalum Target

Shape:: Round/as Request

Purity:: 99.95%

Certificate:: ISO9001:2008

Supply Ability:: Sustainable And Efficient

Material:: 99.95% Tantalum

Melting Point:: 2980℃

Additional Info

Packaging: Best supplier from china will packing with: 1>First packaging with moisture-proof paper 2>Second packaging with kraftpape 3>Third packaging with foam plastics in all side of plywood case 4>Finally packing products in plywood case

Productivity: 100kg

Brand: ZHIPU

Transportation: Ocean,Land,Air

Place of Origin: Shaanxi

Supply Ability: 100kg

Certificate: ISO9001

Port: Tianjin,Qingdao,Shanghai

Product Description

Good quality tantalum sputtering target is the main products of our company. Good quality tantalum sputtering target is widely used in industrial, especially used in single crystal furnace and vacuum furnace.
Good quality tantalum sputtering target belongs to refractory metals, and Good quality tantalum sputtering target has the high melting point. so the feature of Good quality tantalum sputtering target is high temperature resistance.

target

Product name	Good quality tantalum sputtering target
Material	Tantalum
Processing way	According to drawing processing, according to sample processing
Processing technology	Casting,forging,rolling,stamping,tailoring,car milling planer grinding drilling and boring etc.

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Looking for ideal Tantalum Sputtering Targets Manufacturer & supplier ? We have a wide selection at great prices to help you get creative. All the High Purity Tantalum Sputtering Target are quality guaranteed. We are China Origin Factory of Tantalum Sputtering Target with High Quality. If you have any question, please feel free to contact us.

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